Dear Colleagues,

On behalf of BIAMS2020 Organizing Committee, we encourage you to participate in the 15th International Conference "Beam Injection Assessment of Microstructures in Semiconductors", which will be held on the 19-24 July, 2020 in Saint Petersburg, Russia.


We inform you that the abstract submission is already opened. The detailed information is available in the personal account on the website of the Conference, The registration is required.


We also have the pleasure to announce the Organizing Fee.


BIAMS2020 Conference acts as a forum for interaction between physicists, materials scientists and technologists; it gathers scientists from all over the world to present advances in the field of the physical characterization of semiconductors by means of beam injection and related methods. To learn more about the details please visit our website, where the data will be continuously updated. We encourage you to register for this event at your earliest convenience.


Looking forward to seeing you in Saint Petersburg.


Professor Maria Zamoryanskaya, Chairman


The Local Organizing Committee.



email: This email address is being protected from spambots. You need JavaScript enabled to view it.

tel: +7(931)-346-77-43

Meeting agenda:

 Discussion of works submitted for the 2020 FLNP Competition in the section «Scientific-technical applied research»

Superwetting phenomenon: experimental results and possible mechanisms

N.A. Ivanova

(Institute X-BIO, University of Tyumen, Tyumen)


Netosis and application of microscopy methods in the study of cell death

Pleskova Svetlana - Professor, Department of Nanotechnology and Biotechnology

(Nizhny Novgorod State Technical University n.a. R.E. Alekseev)



15.00 – 15.10

A. Ioffe


15.10 – 15.40

V. Shvetsov

Progress report on developing a concept for a new neutron source

15.40 – 16.10

V. Bodnarchuk, A. Ioffe, V. Sadilov

Expected performance of reflectometers and SANS diffractometers at DNS-IV.   

16.10 – 16.40

S. Kulikov

Thermal and cold moderators at a new source

16.40– 17.00

Coffee break

17.00 – 17.45

General discussion

17.45 – 18.00

Closing remarks